Canon Optron, a manufacturer of optical materials with the largest market share in Japan, has been providing the highest quality evaporation materials for transparent conductive films and anti-reflection films, such as metallic oxide and fluoride, in various shapes and sizes to meet the needs for a variety of film forming methods. By leveraging our long accumulated technologies for manufacturing evaporation materials used for optical films, we supply high-purity sputtering targets.
AZO
Targets for ZnO-based Transparent Conductive Films
Primary application areas of sputtering targets are in the fields of flat panel displays and semiconductors, and recently their application has also extended to the thin films for solar cells. At Canon Optron, we have dedicated ourselves in research and development of ZnO (zinc oxide)-based targets (ZnO, AZO, GZO), which are the targets for transparent films used in the applications mentioned above and have attracted attention as alternative materials to ITO.
Film Properties of AZO Target
Figure 1: Example of AZO film formation by DC magnetron sputtering
Figure 2: Arcing properties of improved AZO target
Figure 3: Example of GZO film formation by DC magnetron sputtering