We exhibit latest eveporation materials/optical crystals in "Photonix2015"
(in Tokyo Kokusaitenjijo, April 8-10 2015).
We have released LUMILEAD TNO, our newly developed evaporation material with high refractive index, being capable of effectively preventing dust adherence because of its extremely high antistatic performance.
We have released a new anti-fingerprint(AF) evaporation material, SURFCLEAR100, that achieves the world's highest level of abrasion resistance.
Canon Optron Inc.
1744-1, Kanakubo, Yuki-shi, Ibaraki, Japan
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